Please use this identifier to cite or link to this item: http://doi.org/10.25358/openscience-105
Authors: Reeve, Robert M.
Loescher, André
Kazemi, Hamidreza
Dupé, Bertrand
Mawass, Mohamad-Assaad
Winkler, Thomas
Schönke, Daniel
Miao, Jun
Litzius, Kai
Sedlmayr, Nicholas
Schneider, Imke
Sinova, Jairo
Eggert, Sebastian
Kläui, Mathias
Title: Scaling of intrinsic domain wall magnetoresistance with confinement in electromigrated nanocontacts
Online publication date: 26-Aug-2019
Year of first publication: 2019
Language: english
Abstract: In this work we study the evolution of intrinsic domain wall magnetoresistance (dwmr) with domain wall confinement. notched half-ring nanocontacts are fabricated from permalloy using a special ultrahigh vacuum electromigration procedure to tailor the size of the wire in situ and through the resulting domain wall confinement, we tailor the domain wall width from a few tens of nm down to a few nm. through measurements of the dependence of the resistance with respect to the applied field direction, we extract the contribution of a single domain wall to the mr of the device, as a function of the width of the domain wall in the confining potential at the notch. in this size range, an intrinsic positive mr is found which dominates over anisotropic mr, as confirmed by comparison to micromagnetic simulations. moreover, the mr is found to scale monotonically with the size of the domain wall, delta(dw), as 1/delta(b)(dw), with b = 2.31 /- 0.39. the experimental result is supported by quantum-mechanical transport simulations based on ab initio density functional theory calculations.
DDC: 530 Physik
530 Physics
Institution: Johannes Gutenberg-Universität Mainz
Department: FB 08 Physik, Mathematik u. Informatik
Place: Mainz
ROR: https://ror.org/023b0x485
DOI: http://doi.org/10.25358/openscience-105
URN: urn:nbn:de:hebis:77-publ-592106
Version: Accepted version
Publication type: Zeitschriftenaufsatz
License: In Copyright
Information on rights of use: https://rightsstatements.org/vocab/InC/1.0/
Journal: Physical review : B
99
21
Pages or article number: Art. 214437
Publisher: APS
Publisher place: College Park, Md.
Issue date: 2019
ISSN: 2469-9950
1098-0121
Publisher URL: http://dx.doi.org/10.1103/PhysRevB.99.214437
Publisher DOI: 10.1103/PhysRevB.99.214437
Appears in collections:JGU-Publikationen

Files in This Item:
  File Description SizeFormat
Thumbnail
59210.pdf1.29 MBAdobe PDFView/Open